Equipment

Top-tier technology made available to the UCLA community and beyond.

Equipment Portfolio

All equipment and lab usage rates can be found by contacting Steve Franz. Please specify if you are from UCLA, industry or non-UCLA academia.

Unaxis PECVD

Unaxis PECVD

PFC Sink

PFC Sink

CDE ResMap

CDE ResMap

Steel Solvent Wet Bench

Steel Solvent Wet Bench

DWL 66 LaserWriter

DWL 66 LaserWriter

LogiTech DDP

LogiTech DDP

HF Vapor Etcher

HF Vapor Etcher

ULVAC UNECS-2000 Ellipsometer

ULVAC UNECS-2000 Ellipsometer

Sopra GES5 Ellipsometer

Sopra GES5 Ellipsometer

EDAX Genesis

EDAX Genesis

Unaxis DRIE

Unaxis DRIE

Discovery Denton Sputterer

Discovery Denton Sputterer

HF-BOE

HF-BOE

Ulvac Oxide Etcher

Ulvac Oxide Etcher

Wet Bench 8

Wet Bench 8

Wet Bench 7

Wet Bench 7

Wyko NT3300 Optical Profiler

Wyko NT3300 Optical Profiler

Dektak 6 Surface Profile Measuring System

Dektak 6 Surface Profile Measuring System

Savannah ALD

Savannah ALD

Fiji Thermal and Plasma ALD

Fiji Thermal and Plasma ALD

Atomic Force Microscope

Atomic Force Microscope

Polypro Acid Wet Bench

Polypro Acid Wet Bench

SCI Filmtek 2000

SCI Filmtek 2000

LPCVD Low Temperature Oxide

LPCVD Low Temperature Oxide

Dentak8 Profilometer

Dentak8 Profilometer

FEI Nova 600 Nanolab DualBeam SEM/FIB

FEI Nova 600 Nanolab DualBeam SEM/FIB

Flexus 2320A

Flexus 2320A

Digital Focussing Microscope

Digital Focussing Microscope

Digital Focussing Microscope

Digital Imaging Microscope

Optical Microscopes

Optical Microscopes

Gaertner L116B

Gaertner L116B

Nanospec 210 Computers (2)

Nanospec 210 Computers (2)

Digital Focussing Microscope

Prometrix Omnimap RS-35

Tencor Alpha Step 200

Tencor Alpha Step 200

M&M probe station

M&M probe station

Hitachi S-4700 Cold Field Emission SEM

Hitachi S-4700 Cold Field Emission SEM

FEI Nova 600 Nanolab DualBeam SEM/FIB

Dektak 8 Surface Profilometer

Dektak 6 Surface Profilometer

SCI Filmtek 2000

Porous Si etch bath

Porous Si etch bath

Tousimis 915B Supercritical Dryer

Tousimis 915B Supercritical Dryer

STS Multiplex CVD Deposition System

STS Multiplex CVD Deposition System

PlasmaTherm 790 PECVD

PlasmaTherm 790 PECVD

High temperature clean furnace

High temperature clean furnace

Specialty Coating Systems

Specialty Coating Systems

LPCVD Low Temperature Oxide

LPCVD silicon nitride

LPCVD undoped polysilicon

LPCVD undoped polysilicon

Digital Focussing Microscope

Dry & Wet oxidation and anneals

RTP 650

RTP 650

RTP 610

RTP 610

Denton II

Denton II

Sloan 1800

Sloan 1800

CVC 601

CVC 601

CHA Mark 40 (2)

CHA Mark 40 (2)

Logitech PM5 polisher/grinder

Logitech PM5 polisher/grinder

Matrix 105

Matrix 105

Tegal 421

Tegal 421

Custom XeF2 Vapor Etcher

Custom XeF2 Vapor Etcher

STS AOE Advanced Oxide Etcher

STS AOE Advanced Oxide Etcher

Oxford 80 Plus and Technics Micro RIE 800

Oxford 80 Plus and Technics Micro RIE 800

Plasma-Therm SLR 770 ICP Cl

Plasma-Therm SLR 770 ICP Cl

Digital Focussing Microscope

Plasma-Therm SLR 770 ICP

Plasma-Therm FDRIE DSE II

Plasma-Therm FDRIE DSE II

LPCVD undoped polysilicon

Nitrogen-Purged Muffle Furnace

Digital Focussing Microscope

Programmable Hot Plates

VMR-Vacuum Oven

VMR-Vacuum Oven

Headway Programmable Spin Coaters

Headway Programmable Spin Coaters

Karl Suss SB6 Bonder

Karl Suss SB6 Bonder

Karl Suss MA6 Top and Bottom Side Aligners

Karl Suss MA6 Top and Bottom Side Aligners

Equipment Information